Analysis of chemical composition of electrolytic copper: from trace element control to performance optimization

2025-05-28

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The chemical composition of electrolytic copper, which has a purity of more than 99.97%, in the 

microcosm directly affects the macroscopic physical properties. This paper will deeply reveal the 

content characteristics of more than 20 elements in electrolytic copper, the interaction law and 

its industrial impact, to provide scientific basis for material selection and quality control.


Core component composition system


1. Characteristics of main elements

Copper content: standard electrolytic copper Cu+Ag≥99.95%, high purity grade up to 99.999%.

Silver element: natural companion content of 0.002%-0.05%, with a conductive enhancement effect

Oxygen: 5-50ppm, Cu₂O exists at the grain boundary.


2. Trace element classification

Element type Typical content range Main existence form

Metallic impurities 10-500ppm Solid solution/intermetallic compounds

Non-metallic impurities 1-30ppm Oxides/Sulfides

Gaseous elements 0.1-5ppm Lattice gaps/micropores


Key Impurity Element Influence Mechanisms


1. Conductivity killer elements

Phosphorus (P): every 0.01% increase in conductivity decreased by 10% IACS

Iron (Fe): formation of FeCu₄ ordered phases, increasing electron scattering

Sulfur (S): with copper to generate Cu₂S, resistivity increased by 30 times


2. Mechanical properties of the regulatory elements

Arsenic (As): content of 0.001% tensile strength increase of 15%

Antimony (Sb): more than 0.005% leads to increased cold brittleness

Bismuth (Bi): 0.0001% of the hot working cracking


3. Corrosion resistance damage elements

Oxygen (O): content > 200ppm accelerate intergranular corrosion

Chlorine (Cl): 0.5ppm trigger stress corrosion cracking

Hydrogen (H): 1ppm lead to “hydrogen disease” defects


Comparison of international standard system


1. China GB/T 467-2010

Cu+Ag≥99.95%

Oxygen content ≤ 0.04

Sulfur content ≤ 0.003%


2. U.S. ASTM B115

Total metal impurity≤0.04%

Selenium+Tellurium≤0.0005%

Bismuth ≤0.0005%


3. Europe EN 1976

Arsenic+Antimony≤0.0015%

Iron+Nickel≤0.003%

Zinc ≤ 0.002%


Chemical control of the production process


1. Electrolytic refining control

Electrolyte composition: Cu²⁺ 40-50g / L, H₂SO₄ 180-220g / L

Temperature control: 55±2°C

Current density: 220-280A/m²


2. Impurity removal technology

Vacuum deoxidizing: residual oxygen ≤5ppm

Area melting: metal impurities ≤ 0.001%

Electrolytic purification: recovery rate of precious metal>99


3. Gas element control

Melt covering agent: charcoal + borax

Inert gas refining: argon flow 0.5m³/t

Vacuum casting pressure: ≤ 10-³Pa


Detection and analysis technology evolution


1. Spectral analysis method

Inductively coupled plasma (ICP) detection limit 0.01ppm

Glow discharge mass spectrometry (GD-MS) accuracy up to ppb level

X-ray fluorescence (XRF) rapid detection error <0.005%.


2. Microscopic characterization techniques

Transmission electron microscopy (TEM) to observe grain boundary aggregation

Surface composition analysis by Auger Electron Spectroscopy (AES)

Secondary Ion Mass Spectrometry (SIMS) for three-dimensional elemental distribution


3. Physical property correlation

Resistivity method to assess total impurities: 0.0001% impurities cause 0.1% change in resistance

Hardness test for inverse alloying elements: 0.001% solid solution impurities for every 1 increase in HV

Thermal analysis to detect gas content: DSC curve heat absorption peaks to locate hydrogen and oxygen content.


Chemical Adaptation for Application Scenarios


1. Electronic grade copper foil

Sulfur + selenium <0.0005%

Surface profile Ra≤0.3μm

Grain size 10-25μm


2. Superconducting materials

Iron+Nickel<0.0001%

Oxygen content ≤3ppm

Residual resistance ratio RRR>300


3. Vacuum device

Total gas <2ppm

Volatiles ≤0.001%

Outgassing rate<1×10-¹⁰Pa-m³/s


Future technological breakthrough direction


1. Limit purity control

6N grade (99.9999%) copper mass production technology

Single crystal copper dislocation density <10²/cm²

Surface contamination control <0.1 atomic layer


2. Precision element design

Trace rare earth modification (La,Ce add 0.0001-0.001%)

Nano-precipitation phase modification (5-10nm oxide dispersion)

Gradient composition structure (surface/core difference <0.005%)


3. Green preparation process

Recycling rate of electrolyte>99%

Recovery rate of impurity elements>95%

Energy consumption reduced to 2000kWh/t


Conclusion


The control of the chemical composition of copper electrolyte is a precise material science, and a 

0.001% change in content may trigger a cascade reaction in performance. With nanoscale 

breakthroughs in analytical technology and atomic-level regulation of preparation processes, 

modern industry is unraveling the ultimate code for the microscopic composition of copper 

materials. From semiconductor chips to fusion reactors, precise control of the chemical 

composition of copper will become the core competitiveness for breaking through 

technical bottlenecks and creating new material systems.